Electrostatically Unbalanced Magnetrons.wmv

master.lnl.infn.it In magnetron sputtering with a suitable magnetic field configuration it is also possible to control the microstructure, chemical and phase composition of the growing film. Besides balanced discharges, two types of unbalancements are possible type I and type II. In type I, the plasma that is not strongly confined on the target, does not interact with the substrate. This magnetic assessment is specially used for sputtering multi-compositional films containing low melting ...
Author: PalmieriProfEnzo; Tags: Magnetron Sputtering thin film deposition Vacuum films PVD Palmieri Surface Treatments Trattamenti di Superficie


















